UTKARSHKUMAR SHAH. Firmware-Controlled Precision Edge Ring Positioning for Improved Wafer-Level Etch Uniformity in Plasma Etch Semiconductor Equipment. International Journal of Computer Information Systems and Industrial Management Applications, [S. l.], v. 18, n. 6s, p. 196–204, 2026. DOI: 10.70917/ijcisim-2026-2879. Disponível em: https://cspub-ijcisim.org/index.php/ijcisim/article/view/2879. Acesso em: 11 jul. 2026.